About
Experience & Education
Patents
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Apparatus and method for optical interference fringe based integrated circuit processing
US 11362240
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Method and Apparatus for Addressing Thickness Variations of a Trench Floor Formed in a Semiconductor Substrate
US 7115426
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Method and Apparatus for Forming a Trench Through a Semiconductor Substrate.
US 10160606
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Method and Apparatus for Improvement of Material/Voltage Contrast.
US 11251966
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Method and System for Integrated Circuit Backside Navigation.
US 7135123
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Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench.
US 10161272
Languages
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Korean
Professional working proficiency
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French
Native or bilingual proficiency
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English
Native or bilingual proficiency
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